Precision and volume are the key metrics. They have precision here, but it looks like they won’t get volume.
“E-beam lithography machines cannot produce chips at a large scale like Dutch company ASML’s DUV and EUV lithography systems, but they excel in the testing stage of production, offering high-precision circuit patterning and design flexibility.
Priced lower than imported machines, Xizhi can pattern circuit lines as narrow as 8 nanometres, with a positioning accuracy of 0.6 nanometres – matching international standards.”
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Precision and volume are the key metrics. They have precision here, but it looks like they won’t get volume.
“E-beam lithography machines cannot produce chips at a large scale like Dutch company ASML’s DUV and EUV lithography systems, but they excel in the testing stage of production, offering high-precision circuit patterning and design flexibility. Priced lower than imported machines, Xizhi can pattern circuit lines as narrow as 8 nanometres, with a positioning accuracy of 0.6 nanometres – matching international standards.”